EP Patent

EP2472320A2 — Compositions comprising base-reactive component and processes for photolithography

Assigned to DuPont Electronic Materials International LLC · Expires 2012-07-04 · 14y expired

What this patent protects

New photoresist compositions are provided that comprise one or more materials that have base-reactive groups and are particularly useful for dry lithography. Particularly preferred photoresists of the invention can exhibit reduced defects following development of a coating layer …

USPTO Abstract

New photoresist compositions are provided that comprise one or more materials that have base-reactive groups and are particularly useful for dry lithography. Particularly preferred photoresists of the invention can exhibit reduced defects following development of a coating layer of the resist..

Drugs covered by this patent

Patent Metadata

Patent number
EP2472320A2
Jurisdiction
EP
Classification
—
Expires
2012-07-04
Drug substance claim
No
Drug product claim
No
Assignee
DuPont Electronic Materials International LLC
Source
FDA Orange Book + USPTO grounding via Google Patents

Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.

Track this patent

Get a daily-checked alert when vulnerability score, expiry, classification, or assignee changes. Email, Slack, or Teams delivery. Pro: 50 watches, Free: 3.