EP Patent

EP1452622A3 — Target and process for its production, and method for forming a film having a high refractive index

Assigned to AGC Ceramics Co Ltd · Expires 2004-09-29 · 22y expired

What this patent protects

A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MO x as the main component, wherein MO x is a metal oxide which is deficient in oxygen as compared with the stoi…

USPTO Abstract

A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MO x as the main component, wherein MO x is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.

Drugs covered by this patent

Patent Metadata

Patent number
EP1452622A3
Jurisdiction
EP
Classification
—
Expires
2004-09-29
Drug substance claim
No
Drug product claim
No
Assignee
AGC Ceramics Co Ltd
Source
FDA Orange Book + USPTO grounding via Google Patents

Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.

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