EP1037012A1 — Method and apparatus for measurements of patterned structures

USPTO Abstract

A method for measuring at least one desired parameter of a patterned structure (10) having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle (12) formed of at least two locally adjacent elements (12a, 12b) having different optical properties in respect of an incident radiation. An optical model, based on at least some of the features of the structure is provided. The model is capable of determining theoretical data (D t ) representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area, which is substantially larger than a surface area of the structure defined by the grid cycle, is illuminated by an incident radiation of a preset substantially wide wavelength range. Light component substantially specularly reflected from the measurement area is detected and measured data (D m ) representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data are analyzed and the optical model is optimized until the theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.