EP0539559A1 — HIGH DURABILITY MASK FOR DRY ETCHING OF GaAs
Assigned to Eastman Kodak Co · Expires 1993-05-05 · 33y expired
What this patent protects
Disclosed is a mask for fabricating GaAs devices, such as waveguides, channels, facets, mesas, and mirrors, using dry etch processing in environments containing chlorine. The mask consists of an amorphous form of carbon which may contain incorporated hydrogen. The mask can be app…
USPTO Abstract
Disclosed is a mask for fabricating GaAs devices, such as waveguides, channels, facets, mesas, and mirrors, using dry etch processing in environments containing chlorine. The mask consists of an amorphous form of carbon which may contain incorporated hydrogen. The mask can be applied, removed and patterned using dry processing techniques.
Drugs covered by this patent
Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.
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