CN Patent

CN116712415A — 一种多奈哌齐口溶膜及其制备方法

Assigned to Lipin Pharmaceutical Xiamen Co ltd · Expires 2023-09-08 · 3y expired

What this patent protects

本发明公开了一种多奈哌齐口溶膜及其制备方法,该口溶膜为双层膜结构,包括含有45‑75%w/w盐酸多奈哌齐的载药层和不含盐酸多奈哌齐的背衬层。本口溶膜中盐酸多奈哌齐处于结晶状态,以降低杂质增长,处方中还含有优选的疏水材料,以提高药物稳定性并降低药物在口腔中的溶出量。

USPTO Abstract

本发明公开了一种多奈哌齐口溶膜及其制备方法,该口溶膜为双层膜结构,包括含有45‑75%w/w盐酸多奈哌齐的载药层和不含盐酸多奈哌齐的背衬层。本口溶膜中盐酸多奈哌齐处于结晶状态,以降低杂质增长,处方中还含有优选的疏水材料,以提高药物稳定性并降低药物在口腔中的溶出量。

Drugs covered by this patent

Patent Metadata

Patent number
CN116712415A
Jurisdiction
CN
Classification
Expires
2023-09-08
Drug substance claim
No
Drug product claim
No
Assignee
Lipin Pharmaceutical Xiamen Co ltd
Source
FDA Orange Book + USPTO grounding via Google Patents

Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.

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