CN Patent

CN116640088A — 一种高纯度雷芬那辛的制备方法

Assigned to New Leading Chongqing Pharmaceutical Technology Co ltd · Expires 2023-08-25 · 3y expired

What this patent protects

本发明公开了一种高纯度雷芬那辛的制备方法,涉及有机合成技术领域。具体方法包括如下步骤:化合物1与化合物2,在缩合剂EDCI的作用下,经过酰胺缩合反应得到雷芬那辛粗品;雷芬那辛粗品溶液经过浓缩后,加入不良溶剂,析出高纯度雷芬那辛成品。该方法反应路线短,操作简便,无需经过柱层析纯化,更易于获得高纯度雷芬那辛产品,同时能有效避免杂质I的产生,可将杂质I的含量控制在0.10%以内。

USPTO Abstract

本发明公开了一种高纯度雷芬那辛的制备方法,涉及有机合成技术领域。具体方法包括如下步骤:化合物1与化合物2,在缩合剂EDCI的作用下,经过酰胺缩合反应得到雷芬那辛粗品;雷芬那辛粗品溶液经过浓缩后,加入不良溶剂,析出高纯度雷芬那辛成品。该方法反应路线短,操作简便,无需经过柱层析纯化,更易于获得高纯度雷芬那辛产品,同时能有效避免杂质I的产生,可将杂质I的含量控制在0.10%以内。

Drugs covered by this patent

Patent Metadata

Patent number
CN116640088A
Jurisdiction
CN
Classification
Expires
2023-08-25
Drug substance claim
No
Drug product claim
No
Assignee
New Leading Chongqing Pharmaceutical Technology Co ltd
Source
FDA Orange Book + USPTO grounding via Google Patents

Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.

Track this patent

Get a daily-checked alert when vulnerability score, expiry, classification, or assignee changes. Email, Slack, or Teams delivery. Pro: 50 watches, Free: 3.