CN Patent

CN114634514B — 一种去甲羟吗啡酮中杂质的去除方法

Assigned to Gansu Nongken Medicine Alkali Factory Co ltd · Expires 2024-04-09 · 2y expired

What this patent protects

本发明涉及一种去甲羟吗啡酮中杂质的去除方法，该方法是指在酸性条件下，去甲羟吗啡酮中加入亚硫酸氢钠，加热搅拌至75~85℃并保温反应后测定12.5min单杂含量；当该单杂含量低于0.05%后降温至室温，加碱调pH=9，经析晶、过滤，即得去甲羟吗啡酮。本发明方法简单且收率高（可达95%以上），为去甲羟吗啡酮原料药杂质的控制提供了有利保障。

USPTO Abstract

本发明涉及一种去甲羟吗啡酮中杂质的去除方法，该方法是指在酸性条件下，去甲羟吗啡酮中加入亚硫酸氢钠，加热搅拌至75~85℃并保温反应后测定12.5min单杂含量；当该单杂含量低于0.05%后降温至室温，加碱调pH=9，经析晶、过滤，即得去甲羟吗啡酮。本发明方法简单且收率高（可达95%以上），为去甲羟吗啡酮原料药杂质的控制提供了有利保障。

Drugs covered by this patent

oxymorphone-hydrochloride (OXYMORPHONE HYDROCHLORIDE)

Patent Metadata

Patent number: CN114634514B
Jurisdiction: CN
Classification: —
Expires: 2024-04-09
Drug substance claim: No
Drug product claim: No
Assignee: Gansu Nongken Medicine Alkali Factory Co ltd
Source: FDA Orange Book + USPTO grounding via Google Patents

Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.

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