CN Patent

CN111320594A — 一种卡利拉嗪杂质及其制备工艺和用途

Assigned to Nhwa Pharmaceutical Corp · Expires 2020-06-23 · 6y expired

What this patent protects

本发明属于药物合成技术领域，涉及一种卡利拉嗪杂质及其制备工艺和用途。具体提供了卡利拉嗪杂质F、杂质E制备的方法；本发明首次合成了卡利拉嗪杂质F、杂质E，杂质E、F可用于卡利拉嗪中间体、原料药及其复方制剂的质量研究。

USPTO Abstract

本发明属于药物合成技术领域，涉及一种卡利拉嗪杂质及其制备工艺和用途。具体提供了卡利拉嗪杂质F、杂质E制备的方法；本发明首次合成了卡利拉嗪杂质F、杂质E，杂质E、F可用于卡利拉嗪中间体、原料药及其复方制剂的质量研究。

Drugs covered by this patent

cariprazine-hydrochloride (CARIPRAZINE HYDROCHLORIDE)

Patent Metadata

Patent number: CN111320594A
Jurisdiction: CN
Classification: —
Expires: 2020-06-23
Drug substance claim: No
Drug product claim: No
Assignee: Nhwa Pharmaceutical Corp
Source: FDA Orange Book + USPTO grounding via Google Patents

Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.

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