CN Patent

CN106220627A — 一种高纯度帕布昔利布的工业化制备方法

Assigned to Nanjing Cuccess Pharmaceutical Co., Ltd. · Expires 2016-12-14 · 9y expired

What this patent protects

本发明涉及一种高纯度帕布昔利布的工业化制备方法。该方法通过亲核反应，Heck反应，重排和脱保护基得到帕布昔利布游离碱。本发明所述帕布昔利布的制备方法具有安全性极高、成本低、环境污染小的优点，易于工业化生产，产品品质符合药用制剂对原料药的要求，符合ICH对原料药的高要求，单杂全部小于0.1％以下。

USPTO Abstract

本发明涉及一种高纯度帕布昔利布的工业化制备方法。该方法通过亲核反应，Heck反应，重排和脱保护基得到帕布昔利布游离碱。本发明所述帕布昔利布的制备方法具有安全性极高、成本低、环境污染小的优点，易于工业化生产，产品品质符合药用制剂对原料药的要求，符合ICH对原料药的高要求，单杂全部小于0.1％以下。

Drugs covered by this patent

Patent Metadata

Patent number
CN106220627A
Jurisdiction
CN
Classification
—
Expires
2016-12-14
Drug substance claim
No
Drug product claim
No
Assignee
Nanjing Cuccess Pharmaceutical Co., Ltd.
Source
FDA Orange Book + USPTO grounding via Google Patents

Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.

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