CN Patent

CN105061373B — 一种达格列净异构体杂质的合成方法

Assigned to Hefei Huafang Pharmaceutical Sciences & Technology Co Ltd · Expires 2017-10-20 · 9y expired

What this patent protects

本发明公开了一种达格列净异构体杂质的合成方法，以2‑氯‑5‑溴苯甲酸为原料，经酰化、付克‑烷基化、羰基还原、缩合、脱甲氧基等反应得到达格列净异构体杂质，为达格列净有关物质的研究提供依据。

USPTO Abstract

本发明公开了一种达格列净异构体杂质的合成方法，以2‑氯‑5‑溴苯甲酸为原料，经酰化、付克‑烷基化、羰基还原、缩合、脱甲氧基等反应得到达格列净异构体杂质，为达格列净有关物质的研究提供依据。

Drugs covered by this patent

Patent Metadata

Patent number
CN105061373B
Jurisdiction
CN
Classification
—
Expires
2017-10-20
Drug substance claim
No
Drug product claim
No
Assignee
Hefei Huafang Pharmaceutical Sciences & Technology Co Ltd
Source
FDA Orange Book + USPTO grounding via Google Patents

Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.

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