CN Patent
CN104945306B — 制备光学纯阿普斯特的方法
Assigned to Shandong Mingkang Medicine Technology Co Ltd · Expires 2017-07-21 · 9y expired
What this patent protects
本发明涉及一种光学纯阿普斯特的制备方法,本发明的制备方法能够得到纯度99.9%以上的光学纯阿普斯特。本发明方法简便,易于操作,是一种适合工业化生产的方法。
USPTO Abstract
本发明涉及一种光学纯阿普斯特的制备方法,本发明的制备方法能够得到纯度99.9%以上的光学纯阿普斯特。本发明方法简便,易于操作,是一种适合工业化生产的方法。
Drugs covered by this patent
- Otezla (APREMILAST) · Amgen
Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.
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