CN104829572B — 达格列净新晶型及其制备方法
Assigned to Jiangsu Hansoh Pharmaceutical Group Co Ltd · Expires 2019-01-04 · 7y expired
What this patent protects
本发明涉及达格列净新晶型及其制备方法。具体而言,本发明涉及式(I)的达格列净的新晶型,这种晶型在以2θ角度和晶面间距(d值)表示的X‑射线粉末衍射图谱中在约4.318(20.45)处具有特征吸收峰,可以通过将达格列净溶解在良性有机溶剂中,再加入不良溶剂搅拌析晶,过滤,干燥而制得。本发明的达格列净新晶型具有以下优良特性:溶解性好,引湿性小,稳定性高,制备可重现性好。
USPTO Abstract
本发明涉及达格列净新晶型及其制备方法。具体而言,本发明涉及式(I)的达格列净的新晶型,这种晶型在以2θ角度和晶面间距(d值)表示的X‑射线粉末衍射图谱中在约4.318(20.45)处具有特征吸收峰,可以通过将达格列净溶解在良性有机溶剂中,再加入不良溶剂搅拌析晶,过滤,干燥而制得。本发明的达格列净新晶型具有以下优良特性:溶解性好,引湿性小,稳定性高,制备可重现性好。
Drugs covered by this patent
- Farxiga (DAPAGLIFLOZIN) · AstraZeneca
Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.
Track this patent
Get a daily-checked alert when vulnerability score, expiry, classification, or assignee changes. Email, Slack, or Teams delivery. Pro: 50 watches, Free: 3.