CN Patent

CN104788438B — 恩格列净b晶型及其制备

Assigned to Jiangsu Li Hua Bioisystech Co., Ltd · Expires 2018-02-02 · 8y expired

What this patent protects

本发明涉及恩格列净晶型B及其制备方法，制备的恩格列净晶型B通过粉末X‑射线衍射图表征，具有包括在衍射角2θ：8.916度、10.011度、11.239度、17.567度、18.775度、19.308度、25.353度及26.000度处的衍射峰，所述粉末X‑射线衍射图是用CuKα射线得到的图谱，本发明的晶型制备工艺简单，稳定性较好，符合药用要求。

USPTO Abstract

本发明涉及恩格列净晶型B及其制备方法，制备的恩格列净晶型B通过粉末X‑射线衍射图表征，具有包括在衍射角2θ：8.916度、10.011度、11.239度、17.567度、18.775度、19.308度、25.353度及26.000度处的衍射峰，所述粉末X‑射线衍射图是用CuKα射线得到的图谱，本发明的晶型制备工艺简单，稳定性较好，符合药用要求。

Drugs covered by this patent

Patent Metadata

Patent number
CN104788438B
Jurisdiction
CN
Classification
—
Expires
2018-02-02
Drug substance claim
No
Drug product claim
No
Assignee
Jiangsu Li Hua Bioisystech Co., Ltd
Source
FDA Orange Book + USPTO grounding via Google Patents

Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.

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