CA2256847A1 — Particle-free cathodic arc carbon ion source
Assigned to McGill University · Expires 2000-06-22 · 26y expired
What this patent protects
A method and apparatus for vacuum arc deposition of carbon on a substrate inhibits or eliminates emission of contaminating carbon particles in the ion plasma by maintaining an elevated local plasma pressure at the cathode or target surface, thereby minimizing the role of heat con…
USPTO Abstract
A method and apparatus for vacuum arc deposition of carbon on a substrate inhibits or eliminates emission of contaminating carbon particles in the ion plasma by maintaining an elevated local plasma pressure at the cathode or target surface, thereby minimizing the role of heat conduction in the creation of the particles and strongly increasing the electron emission cooling effects.
Drugs covered by this patent
- Abilify (aripiprazole) · Generic (originally Otsuka/BMS)
Bibliographic data sourced from FDA Orange Book + USPTO public records. Plain-English summary generated by AI grounded in source text. Patent term extensions (PTR, SPC, pediatric) may shift the effective expiry. Not legal advice.
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